000			01481nam a2200373Ia 4500
001			ebr10180023
003			CaPaEBR
005			20260707181412.0
006			m u
007			cr cn|||||||||
008			020326s2002 nyua sb 001 0 eng d
010			_z 2002021280
020			_z0071389962 (alk. paper)
020			_z9780071500937
040			_aCaPaEBR _cCaPaEBR
035			_a(OCoLC)648268188
050	1	4	_aTK7874.55 _b.S3538 2002eb
082	0	4	_a621.3815 _221
090			_c123493 _d97459
100	1		_aSaint, Christopher. _9148305
245	1	0	_aIC mask design _h[electronic resource] : _bessential layout techniques / _cChristopher Saint, Judy Saint.
260			_aNew York : _bMcGraw-Hill, _cc2002.
300			_axviii, 457 p. : _bill. (some col.).
490	1		_aMcGraw-Hill professional engineering
504			_aIncludes bibliographical references and index.
533			_aElectronic reproduction. _bPalo Alto, Calif. : _cebrary, _d2009. _nAvailable via World Wide Web. _nAccess may be limited to ebrary affiliated libraries.
650		0	_aIntegrated circuit layout.
650		0	_aIntegrated circuits _xMasks _xDesign and construction. _9148307
655		7	_aElectronic books. _2local _9190
700	1		_aSaint, Judy.
710	2		_aebrary, Inc. _9191
830		0	_aMcGraw-Hill professional engineering. _986684
856	4	0	_uhttp://site.ebrary.com/lib/strathmore/Doc?id=10180023 _zAn electronic book accessible through the World Wide Web; click to view
999			_c123493 _d97459