<?xml version="1.0" encoding="utf-8" ?> <rss version="2.0" xmlns:opensearch="http://a9.com/-/spec/opensearch/1.1/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:atom="http://www.w3.org/2005/Atom"> <channel> <title> <![CDATA[Strathmore University Library Search for 'an:156549']]> </title> <!-- prettier-ignore-start --> <link> https://opac.library.strathmore.edu/cgi-bin/koha/opac-search.pl?q=ccl=an%3A156549&#38;sort_by=relevance&#38;format=rss </link> <!-- prettier-ignore-end --> <atom:link rel="self" type="application/rss+xml" href="https://opac.library.strathmore.edu/cgi-bin/koha/opac-search.pl?q=ccl=an%3A156549&#38;sort_by=relevance&#38;format=rss" /> <description> <![CDATA[ Search results for 'an:156549' at Strathmore University Library]]> </description> <opensearch:totalResults>4</opensearch:totalResults> <opensearch:startIndex>0</opensearch:startIndex> <opensearch:itemsPerPage>50</opensearch:itemsPerPage> <atom:link rel="search" type="application/opensearchdescription+xml" href="https://opac.library.strathmore.edu/cgi-bin/koha/opac-search.pl?q=ccl=an%3A156549&#38;sort_by=relevance&#38;format=opensearchdescription" /> <opensearch:Query role="request" searchTerms="q%3Dccl%3Dan%253A156549" startPage="" /> <item> <title> Photomask fabrication technology </title> <dc:identifier>ISBN:</dc:identifier> <!-- prettier-ignore-start --> <link>https://opac.library.strathmore.edu/cgi-bin/koha/opac-detail.pl?biblionumber=110791</link> <!-- prettier-ignore-end --> <description> <![CDATA[ <p> By Eynon, Benjamin G..<br /> New York : McGraw-Hill, .<br /> xi, 571 p. : 24 cm..<br /> </p> ]]> <![CDATA[ <p> <a href="https://opac.library.strathmore.edu/cgi-bin/koha/opac-reserve.pl?biblionumber=110791">Place hold on <em>Photomask fabrication technology</em></a> </p> ]]> </description> <guid>https://opac.library.strathmore.edu/cgi-bin/koha/opac-detail.pl?biblionumber=110791</guid> </item> <item> <title> Photomask fabrication technology </title> <dc:identifier>ISBN:</dc:identifier> <!-- prettier-ignore-start --> <link>https://opac.library.strathmore.edu/cgi-bin/koha/opac-detail.pl?biblionumber=125480</link> <!-- prettier-ignore-end --> <description> <![CDATA[ <p> By Eynon, Benjamin G..<br /> New York : McGraw-Hill, .<br /> xi, 571 p. : 24 cm..<br /> </p> ]]> <![CDATA[ <p> <a href="https://opac.library.strathmore.edu/cgi-bin/koha/opac-reserve.pl?biblionumber=125480">Place hold on <em>Photomask fabrication technology</em></a> </p> ]]> </description> <guid>https://opac.library.strathmore.edu/cgi-bin/koha/opac-detail.pl?biblionumber=125480</guid> </item> <item> <title> Nanolithography and patterning techniques in microelectonics </title> <dc:identifier>ISBN:</dc:identifier> <!-- prettier-ignore-start --> <link>https://opac.library.strathmore.edu/cgi-bin/koha/opac-detail.pl?biblionumber=145087</link> <!-- prettier-ignore-end --> <description> <![CDATA[ <p> Cambridge : | Boca Raton, FL : Woodhead Pub. ; | CRC Press, .<br /> xiv, 409 p. : </p> ]]> <![CDATA[ <p> <a href="https://opac.library.strathmore.edu/cgi-bin/koha/opac-reserve.pl?biblionumber=145087">Place hold on <em>Nanolithography and patterning techniques in microelectonics</em></a> </p> ]]> </description> <guid>https://opac.library.strathmore.edu/cgi-bin/koha/opac-detail.pl?biblionumber=145087</guid> </item> <item> <title> Nanolithography and patterning techniques in microelectonics </title> <dc:identifier>ISBN:</dc:identifier> <!-- prettier-ignore-start --> <link>https://opac.library.strathmore.edu/cgi-bin/koha/opac-detail.pl?biblionumber=150086</link> <!-- prettier-ignore-end --> <description> <![CDATA[ <p> Cambridge : | Boca Raton, FL : Woodhead Pub. ; | CRC Press, .<br /> xiv, 409 p. : </p> ]]> <![CDATA[ <p> <a href="https://opac.library.strathmore.edu/cgi-bin/koha/opac-reserve.pl?biblionumber=150086">Place hold on <em>Nanolithography and patterning techniques in microelectonics</em></a> </p> ]]> </description> <guid>https://opac.library.strathmore.edu/cgi-bin/koha/opac-detail.pl?biblionumber=150086</guid> </item> </channel> </rss>
