01346nam a22003494a 4500001001200000003000800012005001700020006001900037007001500056008004100071010001700112020002800129040002100157035002100178050002600199082002000225100002300245245009800268260003700366300003300403490003900436504005100475533015200526650003200678650002400710650002200734655002900756700001600785710001700801830004700818856013100865ebr10195649CaPaEBR20260707181621.0m        u        cr cn|||||||||050415s2005    nyua    sb    001 0 eng    z  2005047886  z0071445633 (alk. paper)  aCaPaEBRcCaPaEBR  a(OCoLC)64766955614aTK7872.M3bE99 2005eb04a621.3815/312221 aEynon, Benjamin G.10aPhotomask fabrication technologyh[electronic resource] /cBenjamin G. Eynon, Jr., Banqiu Wu.  aNew York :bMcGraw-Hill,cc2005.  axi, 571 p. :bill. ;c24 cm.1 aMcGraw-Hill electronic engineering  aIncludes bibliographical references and index.  aElectronic reproduction.bPalo Alto, Calif. :cebrary,d2009.nAvailable via World Wide Web.nAccess may be limited to ebrary affiliated libraries. 0aIntegrated circuitsxMasks. 0aMasks (Electronics) 0aMicrolithography. 7aElectronic books.2local1 aWu, Banqiu.2 aebrary, Inc. 0aMcGraw-Hill electronic engineering series.40uhttp://site.ebrary.com/lib/strathmore/Doc?id=10195649zAn electronic book accessible through the World Wide Web; click to view