01464nam a22003734a 4500001001200000003000800012005001700020006001900037007001500056008004100071010001700112020002800129040002100157035002100178050002600199082002000225090001800245100003100263245009800294260003700392300003300429490003900462504005100501533015200552650004000704650003200744650003000776655003400806700002400840710002200864830005500886856013100941999001801072ebr10195649CaPaEBR20260707180619.0m        u        cr cn|||||||||050415s2005    nyua    sb    001 0 eng    z  2005047886  z0071445633 (alk. paper)  aCaPaEBRcCaPaEBR  a(OCoLC)64766955614aTK7872.M3bE99 2005eb04a621.3815/31222  c110791d879221 aEynon, Benjamin G.915654610aPhotomask fabrication technologyh[electronic resource] /cBenjamin G. Eynon, Jr., Banqiu Wu.  aNew York :bMcGraw-Hill,cc2005.  axi, 571 p. :bill. ;c24 cm.1 aMcGraw-Hill electronic engineering  aIncludes bibliographical references and index.  aElectronic reproduction.bPalo Alto, Calif. :cebrary,d2009.nAvailable via World Wide Web.nAccess may be limited to ebrary affiliated libraries. 0aIntegrated circuitsxMasks.9156547 0aMasks (Electronics)9156548 0aMicrolithography.9156549 7aElectronic books.2local91901 aWu, Banqiu.91565502 aebrary, Inc.9191 0aMcGraw-Hill electronic engineering series.912273740uhttp://site.ebrary.com/lib/strathmore/Doc?id=10195649zAn electronic book accessible through the World Wide Web; click to view  c110791d87922