TY  - BOOK
AU  - Eynon,Benjamin G.
AU  - Wu,Banqiu
ED  - ebrary, Inc.
TI  - Photomask fabrication technology
T2  - McGraw-Hill electronic engineering
AV  - TK7872.M3 E99 2005eb
U1  - 621.3815/31 22
PY  - 2005///
CY  - New York
PB  - McGraw-Hill
KW  - Integrated circuits
KW  - Masks
KW  - Masks (Electronics)
KW  - Microlithography
KW  - Electronic books
KW  - local
N1  - Includes bibliographical references and index; Electronic reproduction; Palo Alto, Calif.; ebrary; 2009; Available via World Wide Web; Access may be limited to ebrary affiliated libraries
UR  - http://site.ebrary.com/lib/strathmore/Doc?id=10195649
ER  -