01464nam a22003734a 4500 ebr10195649 CaPaEBR 20260707180619.0 m u cr cn||||||||| 050415s2005 nyua sb 001 0 eng 2005047886 0071445633 (alk. paper) CaPaEBR CaPaEBR (OCoLC)647669556 TK7872.M3 E99 2005eb 621.3815/31 22 110791 87922 Eynon, Benjamin G. 156546 Photomask fabrication technology [electronic resource] / Benjamin G. Eynon, Jr., Banqiu Wu. New York : McGraw-Hill, c2005. xi, 571 p. : ill. ; 24 cm. McGraw-Hill electronic engineering Includes bibliographical references and index. Electronic reproduction. Palo Alto, Calif. : ebrary, 2009. Available via World Wide Web. Access may be limited to ebrary affiliated libraries. Integrated circuits Masks. 156547 Masks (Electronics) 156548 Microlithography. 156549 Electronic books. local 190 Wu, Banqiu. 156550 ebrary, Inc. 191 McGraw-Hill electronic engineering series. 122737 http://site.ebrary.com/lib/strathmore/Doc?id=10195649 An electronic book accessible through the World Wide Web; click to view 110791 87922