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Photomask fabrication technology [electronic resource] / Benjamin G. Eynon, Jr., Banqiu Wu.

By:

Eynon, Benjamin G

Contributor(s):

Series: McGraw-Hill electronic engineering seriesPublication details: New York : McGraw-Hill, c2005.Description: xi, 571 p. : ill. ; 24 cmSubject(s):

Genre/Form:

Electronic books.

DDC classification:

621.3815/31 22

LOC classification:

TK7872.M3 E99 2005eb

Online resources:

An electronic book accessible through the World Wide Web; click to view

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Holdings: http://site.ebrary.com/lib/strathmore/Doc?id=10195649

Includes bibliographical references and index.

Electronic reproduction. Palo Alto, Calif. : ebrary, 2009. Available via World Wide Web. Access may be limited to ebrary affiliated libraries.

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