Photomask fabrication technology [electronic resource] /
Eynon, Benjamin G.
Photomask fabrication technology [electronic resource] / Benjamin G. Eynon, Jr., Banqiu Wu. - New York : McGraw-Hill, c2005. - xi, 571 p. : ill. ; 24 cm. - McGraw-Hill electronic engineering . - McGraw-Hill electronic engineering series. .
Includes bibliographical references and index.
Electronic reproduction.
Palo Alto, Calif. :
ebrary,
2009.
Available via World Wide Web.
Access may be limited to ebrary affiliated libraries.
Integrated circuits--Masks.
Masks (Electronics)
Microlithography.
Electronic books.
TK7872.M3 / E99 2005eb
621.3815/31
Photomask fabrication technology [electronic resource] / Benjamin G. Eynon, Jr., Banqiu Wu. - New York : McGraw-Hill, c2005. - xi, 571 p. : ill. ; 24 cm. - McGraw-Hill electronic engineering . - McGraw-Hill electronic engineering series. .
Includes bibliographical references and index.
Electronic reproduction.
Palo Alto, Calif. :
ebrary,
2009.
Available via World Wide Web.
Access may be limited to ebrary affiliated libraries.
Integrated circuits--Masks.
Masks (Electronics)
Microlithography.
Electronic books.
TK7872.M3 / E99 2005eb
621.3815/31